Method for fabricating pixelized phosphors

Abstract

A process for fabricating a pixelized phosphor having a space between the pixels in the range of about 0.5-25 microns, the process comprising the steps of: (a) depositing a phosphor on a support; (b) exposing the deposited phosphor to a source of electromagnetic radiation through a mask thereby ablating the phosphor segmentally, resulting in a series of structures in both said X and Y directions to produce an array of pixelized phosphors separated by slots; (c) filling the resulting slots between the pixelized phosphors with phosphor material of the same or different composition as utilized in step (a) such that each of the pixelized phosphors on the support are separated by a width of from about 0.5-25 microns; and (d) optionally, planarizing the pixelized phosphors.

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