US 5,298,761 A · Method and apparatus for exposure process

Abstract

In the manufacture of a device having a relatively large area, e.g., a liquid crystal device by a lithographic technique, using at least one of a plurality of original images and defining an exposed pattern by each original image as an individual subdivision area, the position of a substrate is changed relatively upon exposure of every subdivision area to expose on the substrate a composite exposed pattern of a relatively large area composed of the plurality of abutting and combined subdivision areas. When aligning each of the original images with the substrate in accordance with predetermined target position information, the amounts of relative deviation at the abutting portions of the subdivision areas (i.e., stitching errors) are preliminarily determined and compensating values tending to reduce each of the stitching errors to less than a given tolerance value are added to the target position information, thereby effecting the alignment. Thus, the stitching accuracy is improved for the composite pattern on the whole.

Claims18

Dependent claims

A method of using at least one of a plurality of original images each containing the same or a different pattern, and moving positions of a light-sensitive substrate and each of said original images relatively so as to successively expose said patterns in such a manner that a plurality of subdivision areas, each composed of an exposure area of each of said original images, are abutted and combined thereby exposing a composite pattern composed of said plurality of patterns stitched together on said light-sensitive substrate, whereby when aligning said original images and said light-sensitive substrate pattern by pattern in accordance with predetermined target position information, said method comprising the steps of:

preliminarily determining amounts of relative deviation in exposure position at abutting portions of said subdivision areas in said composite pattern;
adding compensating values to said target position information so as to reduce said amounts of deviation in exposure position at said abutting portions to less than a predetermined tolerance value;
and
aligning said original images and said light-sensitive substrate pattern by pattern.

1 more element

An exposure apparatus comprising:

stage means adapted to hold a light-sensitive substrate and movable within a plane;
holding means for holding a plurality of original images each containing an optical pattern to be transferred on said light-sensitive substrate substantially parallel to said light-sensitive substrate;
original image alignment means for aligning each of said original images with respect to a reference position of said exposure apparatus;
optical means for exposing the pattern of each of said original images on said light-sensitive substarate;
moving means for moving said light-sensitive substrate on said stage means relative to each of said original images;
control means whereby when successively exposing on the same light-sensitive substrate at least one of said plurality of original images each containing the same or a different pattern, said moving means is controlled in accordance with predetermined position information in such manner that a plurality of subdivision areas each composed of an exposure area by at least one of said original images are abutted and combined;
and
compensating means for calculating compensating values tending to reduce predetermined amounts of relative deviation in exposure position at the abutting portions of said subdivision areas to less than a predetermined tolerance value and applying said compensating values to said control means and said original image alignment means.

5 more elements

Dependencies are inferred from the claim text.

Method and apparatus for exposure process

Life of this patent

Method and apparatus for exposure process

Life of this patent

Abstract

Claims18