Production of Si.sub.2-x P.sub.x N.sub.2+x (NH).sub.1-x, where x=0.1 to 1.0
AssigneeBayer Aktiengesellschaft
InventorsHans-Peter Baldus, Wolfgang Schnick
Life of this patent
Estimating the term…
Abstract
The present invention relates to a process for the production of low-needle silicon nitride of high .alpha.-content, wherein an amorphous nitrogen-containing silane compound is mixed with a crystalline or amorphous compound comprising the elements silicon, phosphorus and nitrogen to form a mixture which is heat-treated at temperatures above 1000.degree. C. to form the low-needle silicon nitride. The present invention also relates to the silicon-, nitrogen- and phosphorus-containing compound which is used as the starting material in the process for the production of the low-needle silicon nitride, and the process for the production of the silicon-, nitrogen- and phosphorus-containing compound.
Claims2
A compound comprising silicon, nitrogen and phosphorus having the composition Si.sub.2-x P.sub.x N.sub.2+x (NH).sub.1-x, where x is from 0.1-1, wherein said compound has a three-dimensional network in which both the phosphorus and the silicon are tetrahedrally surrounded by nitrogen or (N--H) groups.
Dependencies are inferred from the claim text.