Patterning process and microparticles of substantially the same geometry and shape
AssigneeMinnesota Mining and Manufacturing Company
InventorClyde D. Calhoun
Life of this patent
Estimating the term…
Abstract
A method of providing patterned, thin-film materials on flexible substrates by depositing a first, etchable, integral mask onto a substrate, depositing a second pattern material over the mask region and then removing the mask, such as by etching. Patterned films useful as printed circuits and the like can be prepared by this method. In an alternate embodiment, patterned particles can be prepared for dispersion in a vehicle or matrix using the described process.
Claims12
A particulate composition consisting essentially of a population of particles having a non-random distribution of shape, volume and composition, each of said particles comprising two or more distinct layers consisting essentially of inorganic materials, said layers distributed along a first dimension of each of said particles, said first dimension of all particles within the population being substantially the same, each of said layers having exposed edges with said edges being substantially coextensive with the edges of an adjacent layer and remaining physically outside the plane of any adjacent layer, and said particles have shapes and sizes determined by the configuration of a deposition mask.
Dependencies are inferred from the claim text.