Method for preparing negative-working wash-off relief images
AssigneeE. I. Du Pont de Nemours and Company
InventorsSheau-Hwa Ma, Andrew E. Matthews
Life of this patent
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Abstract
A method for preparing high resolution negative-working wash-off relief images comprising the sequential steps of: (a) providing a non-photosensitive, aqueous processable layer, preferably on a substrate, said layer comprising a dispersion of solvent-coalesceable particles in a polymer matrix; (b) imagewise applying an ink to the non-photosensitive layer to coalesce the particles and form a water-insoluble polymer blend between the particles and the polymer matrix in the ink applied areas; and (c) washing the layer with an aqueous developer solution to remove the non-ink applied areas of the layer.
Claims14
A method for preparing negative-working wash-off relief images comprising the sequential steps of:
- (a) providing a non-photosensitive, aqueous processable layer, said layer comprising a dispersion of solvent-coalesceable particles in a polymer matrix;
- (b) imagewise applying an ink to the non-photosensitive layer to coalesce the particles and form a continuous phase, water insoluble polymer blend of coalesced particles with the polymer matrix in the ink applied areas;
- and
- (c) washing the layer with an aqueous developer to remove the non-ink applied areas of the layer.
Dependencies are inferred from the claim text.