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US 5,292,395 AGranted
ECR plasma reaction apparatus having uniform magnetic field gradient
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorNobuo Fujiwara
Life of this patent
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Abstract
A plasma reaction apparatus has main and auxiliary magnetic field generating coils for generating a magnetic field which has a gradient of no more than 50 gauss/cm in the axial direction and a difference between the axial magnetic field gradient and the magnetic field gradient ten centimeters from the axis of no more than 10 gauss/cm for processing a semiconductor substrate. The plasma reaction apparatus is able to generate a high density, uniform plasma so that the semiconductor substrate is uniformly processed at high speed.
Claims9
A plasma reaction apparatus comprising:
- a reaction chamber for accommodating a semiconductor substrate;
- a waveguide connected to said reaction chamber for introducing microwave energy into said reaction chamber;
- and
- magnetic field generating means disposed around said reaction chamber and having a central axis for generating a magnetic field having an axial gradient of no more than 50 gauss/cm along the central axis of said magnetic field generating means and a second magnetic field gradient along a direction parallel to the central axis and spaced from the central axis by ten centimeters wherein the difference between the axial and the second magnetic field gradients does not exceed 10 gauss/cm, and for exciting an electronic cyclotron resonance in a plasma produced by the microwave energy for processing a semiconductor substrate in said reaction chamber.
1 more element
A plasma reaction apparatus comprising:
- a reaction chamber including a gas inlet and a gas outlet for introducing a gas into and exhausting a gas from said reaction chamber;
- a wave guide connected to said reaction chamber for introducing microwave energy into said reaction chamber for producing a plasma in a gas within said reaction chamber;
- and
- magnetic field generating means disposed surrounding said reaction chamber for producing a magnetic field within said reaction chamber for producing electron cyclotron resonance in a plasma in said reaction chamber, said magnetic field generating means comprising a main solenoid coil, an auxiliary coil proximate and spaced from said main solenoid coil, and a mirror coil remote from said main solenoid coil, said auxiliary coil being disposed intermediate said main solenoid coil and said mirror coil
1 more element
Dependencies are inferred from the claim text.