Back to results
US 5,292,394 AGranted
Apparatus for large-area ionic etching
AssigneeLeybold Aktiengesellschaft
InventorsBernhard Cord, Helmut Rauner
Life of this patent
Estimating the term…
Abstract
An evacuable tank having gas inlet and gas outlet openings, with at least one large-area anode at ground potential and a cathode provided as a substrate holder disposed substantially parallel thereto and connected to a high-frequency voltage source. The anode surface has step-shaped areas each being spaced at a different distance from the cathode in order to maintain a uniform ion concentration and therefore a uniform plasma.
Claims10
Apparatus for ionic etching of a large area of a substrate, comprising
- an evacuable tank enclosure,
- a planar cathode provided as a substrate holder in said enclosure and connected to a high frequency voltage source,
- an inlet for introducing a gas to be ionized to said enclosure,
- an outlet for removing said gas from said enclosure, and
- a first anode situated between said inlet and said outlet, said anode having continuous surface which is stepped to form planar areas facing said cathode substantially parallel to said cathode, the distance between said surface and said cathode decreasing from said inlet toward said outlet, said anode being at group potential.
2 more elements
Dependencies are inferred from the claim text.