Method for measuring eccentricity
AssigneeOlympus Optical Co., Ltd.
InventorTadashi Morokuma
Life of this patent
Estimating the term…
Abstract
A method for measuring eccentricity uses two radial gratings, in annular areas of which elementary patterns are provided at equal intervals so that the patterns of one radial grating are opposite to those of the other radial grating rotated by 180.degree.. Reference lines are provided on a rotary axis having eccentricity to be measured, coordinate axes relative to a bisector of the patterns opposite to each other are provided parallel with the reference lines, and spaces between the coordinate axes and the reference lines are measured, thereby allowing the shift of the rotary axis to be found. Thus, the eccentricity of the rotary axis can be measured with high accuracy.
Claims4
A method for measuring eccentricity in an apparatus provided with a first radial grating having elementary patterns at substantially equal intervals on a circumference and a second radial grating having elementary patterns identical with those of said first radial grating,
- said first radial grating and said second radial grating being maintained in mutually fixed relation at a position where said second radial grating is rotated by 180.degree. with respect to said first radial grating,
- said first radial grating and said second radial grating being arranged so that the elementary patterns of said first and second radial gratings are substantially concentric with respect to a rotary axis having two reference lines intersecting with each other,
- wherein a position of an intersection of the reference lines is measured with respect to a coordinate system which includes a bisector of an angle made by one of the elementary patterns of said first radial grating with that of said second radial grating opposite thereto and which is formed by two lines parallel to the reference lines provided on said rotary axis, and thereby eccentricity of said rotary axis is measured with respect to an origin of said coordinate system.
A method for correcting eccentricity in an apparatus provided with a first radial grating having elementary patterns at substantially equal intervals on a circumference and a second radial grating having elementary patterns identical with those of said first radial grating,
- said first radial grating and said second radial grating being maintained in mutually fixed relation at a position where said second radial grating is rotated by 180.degree. with respect to said first radial grating,
- said first radial grating and said second radial grating being arranged so that the elementary patterns of said first and second radial gratings are substantially concentric with respect to a rotary axis having two reference lines,
- wherein the reference lines are made to coincide with a coordinate system which includes a bisector of an angle made by one of the elementary patterns of said first radial grating with that of said second radial grating opposite thereto and which is formed by two lines parallel to the reference lines provided on said rotary axis, and thereby positioning of said rotary axis is performed.
An apparatus for measuring eccentricity, comprising:
- a first radial grating having elementary patterns arranged at substantially equal intervals on a circumference;
- a second radial grating having elementary patterns identical with those of said first radial grating, rotated 180.degree. with respect to said first radial grating;
- an illumination system for illuminating said first radial grating;
- an optical projection system having a magnification of -1.times., for projecting images of the elementary patterns of said first radial grating on the elementary patterns of said second radial grating;
- a rotary axis having reference lines intersecting with each other;
- and
- a detection system for detecting a shift of the elementary patterns of said first and second radial grating from the reference lines.
Dependencies are inferred from the claim text.