Apparatus for maximizing light beam utilization
AssigneeInternational Business Machines Corporation
InventorsHow T. Lin, Mark V. Pierson
Life of this patent
Estimating the term…
Abstract
The present invention is an apparatus and method for maximizing light beam utilization in patterning applications by positioning a plurality of mask mirrors in the light beam path to form patterned light onto a plurality of work pieces. Each mask mirror is designed so that a portion of the light beam area needed for exposing a work piece to patterned light is reflected from the mask mirror, while the remainder is passed through the mask mirror to another mask mirror. Alternatively, each mask mirror can be designed so that a portion of the light beam area needed for exposing a work piece to patterned light is passed through the mask mirror, while the remainder is reflected to another mask mirror.
Claims21
An apparatus for exposing a plurality of work pieces to patterned light, comprising:
- a) a light source for generating a light beam;
- b) a plurality of mask mirrors, each mask mirror having at least one reflective region and at least one transparent region, each mask mirror is positioned so that a portion of said light beam is transmitted thereby and another portion of said light beam is reflected thereby, and
- c) a plurality of pattern defining masks, each pattern defining mask associated with a respective mask mirror, for receiving light from said associated mask mirror to form patterned light on a respective work piece.
An apparatus for exposing a plurality of work pieces to patterned light, comprising:
- a) a light source for generating a light beam;
- b) a plurality of mask mirrors, each mask mirror having one or more reflective regions located within a transparent region, said plurality of mask mirrors positioned so that the light beam impinging on the mask mirror is divided into a patterning portion that is reflected from said plurality of reflective regions and a transparent portion that passes through said transparent region toward the next mask mirror of the plurality of mask mirrors;
- and
- c) a plurality of pattern defining masks, each pattern defining mask associated with a respective mask mirror and positioned so that said patterning portion reflected from said reflective regions of said associated mask mirror impinges on said pattern defining mask so as to form patterned light onto a respective work piece.
An apparatus for exposing a plurality of work pieces to patterned light, comprising:
- a) a light source for generating a light beam;
- b) a plurality of mask mirrors, each mask mirror having one or more transparent regions located within a reflective region, said plurality of mask mirrors arranged so that a light beam impinging on the mask mirror is divided into a patterning portion that passes through said plurality of transparent regions and a reflected portion that is reflected from said reflective region toward the next mirror of the plurality;
- and
- c) a plurality of pattern defining masks, each pattern defining mask associated with a respective mask mirror and arranged so that said patterning portion of light passing through said transparent region of said associated mask mirror impinges on said pattern defining mask so as to form patterned light onto a respective work piece.
Dependencies are inferred from the claim text.