Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient

Abstract

A positive photoresist composition is provided, which comprises an alkali-soluble novolak resin and at least one light-sensitive material represented by formula (III), ##STR1## wherein R.sub.27 and R.sub.28 may be the same or different and which represents --OH, ##STR2## R.sub.29 and R.sub.33 may be the same or different and each represents --H, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryloxy group, a substituted or unsubstituted aralkyloxy group, a substituted or unsubstituted acyl group, a substituted or unsubstituted acyloxy group, a halogen, a nitro group, a cyano group, ##STR3## R.sub.34 to R.sub.39 may be the same or different and each represents --H, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted acyloxy group, ##STR4## with the proviso that the number of ##STR5## substituent groups is at least 2 and not more than 7, and at least four of R.sub.34 to R.sub.39 is a substituent selected from the group consisting of an alkyl group, an alkoxy group, an aryl group, an aralkyl group, and an acyloxy group.

Dependencies are inferred from the claim text.