Back to results
US 5,288,998 AGranted
Manufacturing method including photoresist processing using a near-field optical probe
AssigneeAT&T Bell Laboratories
InventorsRobert E. Betzig, Ernst M. Gyorgy, Jay K. Trautman, Raymond Wolfe
Life of this patent
Estimating the term…
Abstract
An optical system useful, e.g., for near-field scanning optical microscopy is provided. The system incorporates a probe having improved properties. In one embodiment, the probe comprises a tapered and partially metallized portion of a single-mode optical fiber.
Claims3
A method for manufacturing an article, comprising the steps of:
- providing a workpiece having a surface to be patterned;
- and
- impinging actinic, electromagnetic radiation on the surface such that a photochemical change occurs adjacent the surface,
- wherein the impinging step comprises:
- a) admitting incident electromagnetic radiation having at least one incident wavelength into an optical waveguiding body such that a guide dielectric mode is exited within the waveguiding body;
- b) adiabatically converting a portion of the incident radiation from the guided dielectric mode to a guide metallic mode;
- and
- c) emitting a portion of the adiabatically converted light from an aperture that is distant from the surface by no more than the incident wavelength, and that is smaller, in at least one lateral dimension, than the incident wavelength.
5 more elements
Dependencies are inferred from the claim text.