System for igniting a plasma for thin film processing
AssigneeAdvanced Energy Industries, Inc.
InventorLawrence J. Knipp
Life of this patent
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Abstract
A system for igniting a plasma in thin film processing is shown whereby matching network impedances are varied to effect voltage changes. Shunt and series capacitors vary around a limited range so as to achieve substantially all possibilities. A programmed routine of varying in phase, out of phase, and 90.degree. apart in phase is accomplished with a range +/-10% of full variation around some prior value likely to support ignition.
Claims40
A method of igniting a plasma in a plasma processing system comprising the steps of:
- a. establishing a gas within a processing chamber;
- b. determining an initial value of a parameter of said system which is likely to cause said gas to ignite into a plasma;
- c. setting a limited range of values around said initial value, wherein said limited range of values is likely to support ignition of said plasma;
- d. applying electrical power to said gas;
- and
- e. varying said parameter within said limited range of values said range not necessarily causing a specific impedance to obtain ignition of said plasma.
A method of igniting a plasma in a plasma processing system comprising the steps of:
- a. establishing a gas within a processing chamber;
- b. determining a parameter of said system which is likely to affect the ignition of said gas into a plasma;
- c. setting a limited range of values for said parameter within which said gas is likely to ignite into a plasma;
- then
- d. varying said parameter within said limited range of values to obtain ignition of said plasma.
A method of igniting a plasma in a plasma processing system comprising the steps of:
- a. establishing a gas within a processing chamber;
- b. connecting said processing chamber to processing apparatus having a first and a second variable component;
- c. applying electrical power to said gas;
- and
- d. igniting said gas into a plasma through automatic operation of said processing apparatus wherein said automatic operation comprises the steps of:
- i) varying said first and second variable components in phase;
- ii) varying said first and second variable components 180 degrees out of phase;
- and
- iii) varying said first and second variable components 90 degrees apart in phase.
A method of igniting a plasma in a plasma processing system comprising the steps of:
- a. establishing a gas within a processing chamber;
- b. connecting said processing chamber to processing apparatus for processing an item under operating conditions;
- c. applying electrical power to said gas;
- and
- d. igniting said gas into a plasma through automatic operation of said processing apparatus while accomplishing the step of minimizing any impact on said item due to the ignition of said gas into a plasma wherein the step of igniting does not necessarily cause a specific impedance.
A system for igniting a plasma for processing an item comprising:
- a. a chamber within which a gas is contained;
- b. electrical circuitry having a plurality of parameters and connected to said chamber for effecting processing within said chamber;
- c. a means for igniting said gas into a plasma capable of affecting said chamber, wherein said means for igniting comprises:
- i) a means for establishing a limited range of values for a parameter of said electrical circuitry which is likely to support ignition;
- and
- ii) a means for varying said parameter within said established limited range of values said range not necessarily causing a specific impedance so as to ignite said gas into a plasma.
A system for igniting a plasma for processing an item comprising:
- a. a chamber within which a gas is contained;
- b. a means for processing connected to said chamber for effecting processing of an item within said chamber;
- and
- c. a means for igniting said gas into a plasma wherein said means for igniting comprises said means for processing and wherein said means for processing comprises electrical circuitry having more than one element each capable of affecting a voltage across said gas to some degree and wherein said means for igniting comprises a means for varying the two of said variable elements which are capable of affecting the voltage across said gas to the most significant degree and wherein means for varying the two of said variable elements does not necessarily cause a specific impedance.
Dependencies are inferred from the claim text.