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US 5,288,572 AGranted
Method for monitoring photoresist latent images
AssigneeAT&T Laboratories
InventorsKonstantinos P. Giapis, Richard A. Gottscho, Christian A. Green
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Abstract
The formation of latent images in photoresist can be monitored during exposure without spurious images by directing a pulsed beam of monochromatic light onto a region of the layer being exposed and selectively detecting the diffracted light. Peak formation in the normalized diffracted intensity versus time curve indicates optimal exposure of the resist.
Claims7
A method for monitoring during exposure the formation of a latent image in a layer of resist comprising the steps of:
- providing a workpiece having a surface coated with resist;
- exposing a region of said resist to form a latent image in said region;
- during exposure directing a pulsed beam of monochromatic light onto said region of said resist when said latent image is being formed said pulsed beam having an exposure which does not produce a developable image;
- and
- detecting light from said pulsed beam defracted by said latent image.
2 more elements
Dependencies are inferred from the claim text.