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US 5,287,725 AGranted
Surface volatile material detector
AssigneeApplied Materials, Inc.
InventorsJun Zhao, Laszlo Szalai, Boris Fishkin, Terry Francis
Life of this patent
Estimating the term…
Abstract
Surface Volatile Material Detector including a vacuum chamber that is adapted to hold a silicon wafer for testing. The surface of the wafer is exposed to a heat source which evaporates the volatile contaminants on the surface of the wafer. A gas composition analyzer samples the atmosphere within the chamber to detect the evaporated contaminants. The device is designed such that the wafer is thermally insulated from the chamber, whereby the wafer is heated while the chamber walls remain cool, and any contaminants which might exist on the walls of the chamber are not evaporated. In the preferred embodiment, the wafer is heated by infrared light illumination.
Claims20
A surface volatile material detector, comprising:
- a chamber, said chamber having walls enclosing and defining a space within said chamber;
- a wafer holding means, said water holding means being disposed within said chamber and functioning to hold a wafer therewithin;
- a wafer heating means, said wafer heating means functioning to provide heat energy to said wafer held within said wafer holding means, whereby a volatile contaminant that is disposed upon a surface of said wafer will be vaporized by exposure to said heat energy;
- a wafer temperature sensing means, said wafer temperature sensing means being disposed within said chamber and functioning to detect the temperature of a wafer disposed therein;
- a gas analyzer means, said gas analyzer means being engaged to said chamber and functioning to detect said vaporized volatile contaminants.
2 more elements
A surface volatile material detector, comprising:
- a chamber, said chamber having walls enclosing and defining a space within said chamber;
- a wafer holding means, said wafer holding means being disposed within said chamber and functioning to hold a wafer therewithin;
- a wafer heating means, said wafer heating means functioning to provide heat energy to said wafer held within said wafer holding means, whereby a volatile contaminant that is disposed upon a surface of said wafer will be vaporized by exposure to said heat energy;
- said wafer heating means being disposed externally of said chamber, and wherein a segment of said chamber walls is composed of a heat energy transmissive substance, whereby said heat energy may be transmitted through said heat energy transmissive substance to heat a wafer disposed within said chamber;
- said heat energy transmissive substance comprising a quartz glass window, said window being disposed within said chamber walls and forming a part thereof, and wherein said wafer heating means comprises an infrared light energy source which is disposed to project infrared energy through said window to illuminate and heat said wafer within said chamber;
- a heat energy reflector means, said heat energy reflector means being disposed within said chamber and functioning to reflect heat energy which passes through said wafer back towards said wafer;
- a gas analyzer means, said gas analyzer means being engaged to said chamber and functioning to detect said vaporized volatile contaminants.
4 more elements
A surface volatile material detector, comprising:
- a chamber, said chamber having walls enclosing and defining a space within said chamber;
- a vacuum means, said vacuum means being engaged to said chamber and functioning to provide a reduced atmospheric pressure within said chamber;
- a wafer holding means, said wafer holding means being disposed within said chamber and functioning to hold a wafer therewithin;
- a wafer heating means, said wafer heating means being disposed externally of said chamber walls and functioning to provide heat energy to said wafer;
- a segment of said chamber walls being composed of a heat energy transmissive substance, whereby said heat energy may be transmitted through said heat energy transmissive substance to heat said wafer disposed within said chamber, whereupon a volatile contaminant that is disposed upon a surface of said wafer will be vaporized by exposure to said heat energy;
- a wafer temperature sensing means, said wafer temperature sensing means being disposed within said chamber and functioning to detect the temperature of said wafer disposed therein:
- said wafer temperature sensing means being adapted to output a wafer temperature electrical signal indicative of the temperature thereof;
- said wafer heating means further including a wafer heater controlling means, said wafer heater controlling means functioning to control the heat energy output of said wafer heating means;
- said wafer temperature electrical signal being provided to said wafer heating controlling means to provide electrical feedback to control said wafer heater means;
- a wafer insertion and removal means, said wafer insertion and removal means functioning to permit a wafer to be inserted into said chamber for mounting within said wafer holding means, and permitting a wafer to be removed from said wafer holding means and said chamber;
- a gas analyzer means, said gas analyzer means being engaged to said chamber and functioning to detect said vaporized volatile contaminants.
8 more elements
A method for detecting volatile materials disposed upon the surface of a wafer, comprising:
- mounting a wafer within a sealable chamber and sealing said chamber;
- heating said wafer to a temperature sufficient to vaporize materials disposed upon the surface thereof utilizing an infrared heating means;
- controlling said heating means utilizing an electrical controller;
- sensing the temperature of said wafer utilizing a temperature sensing means;
- providing an electrical output signal from said temperature sensing means indicative of the temperature of said wafer to said heater controlling means;
- controlling the heat energy output of said wafer heating means utilizing said heater controlling means based upon said temperature sensor electrical output signal;
- and
- analyzing the gaseous atmosphere within said chamber utilizing a gas analyzing means subsequent to the heating of said wafer, whereby any vaporized materials present within the atmosphere within said chamber are detected.
5 more elements
Dependencies are inferred from the claim text.