Base-soluble polyimide release layers for use in microlithographic processing
AssigneeBrewer Science Inc.
InventorsTony Flaim, James E. Lamb, III, Gregg Barnes, Terry Brewer
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Abstract
Base-soluble release layer compositions for microlithographic processing, comprising nonamic acid functionalized polyamic acid/imide resins are disclosed. These materials permit concurrent lithographic development of photoresist and release layers. They also afford effective lift-off, by alkaline media, even after high imidization.
Claims21
A polyamic acid imide polymer composition, useful as a new and improved wet-developable release-layer in multilayer microlithography, said polymer composition comprising;
- effective amounts of acidic functional moieties abnormal to the amic acid structure at regular positions along the polymer backbone, to effectively impart solubility in alkaline media despite high imidization, wherein said polymer composition further comprises condensation reaction products of diamines and dianhydrides, wherein said diamines consists essentially of acidic functionalized diamines.
A polyamic acid imide polymer composition, useful as a new and improved wet-developable release-layer in multilayer microlithography, said polymer composition comprising effective amounts of acidic functional moieties abnormal to the amic acid structure at regular positions along the polymer backbone, to effectively impart solubility in alkaline media despite high imidization, wherein said acidic functional moieties are selected from the group consisting of aromatic hydroxyls, and sulfonic acids.
A polyamic acid imide polymer composition, useful as a new and improved wet-developable release-layer in multilayer microlithography, said polymer composition comprising effective amounts of acidic functional moieties abnormal to the amic acid structure at regular positions along the polymer backbone, to effectively impart solubility in alkaline media despite high imidization, wherein said polymer composition further comprises condensation reaction products of diamines containing said acidic functional moieties and dianhydrides, wherein said dianhydrides are selected from the group consisting of pyromellitic dianhydride (PMDA), 3,3',4,4'-benzophenone tetracarboxylic dianhydride (BTDA), 4,4'-(hexafluoroisopropylidene)-bis-(phthalic anhydride), 4,4'-oxydiphthalic anhydride, and diphenylsulfone-3,3',4,4'-tetracarboxylic dianhydride.
Dependencies are inferred from the claim text.