Radio frequency induction plasma processing system utilizing a uniform field coil
AssigneeInternational Business Machines Corporation
InventorsJerome J. Cuomo, Charles R. Guarnieri, Jeffrey A. Hopwood, Stanley J. Whitehair
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Abstract
A plasma processing apparatus comprising: a chamber for supporting a workpiece; an inlet for introducing a gas into the chamber; a coil of conductive material having a generally flattened configuration whereby to provide a at least one generally planar surface defined by parallel conductors disposed on the chamber; and apparatus for applying radio frequency energy to the coil.
Claims12
A plasma processing apparatus comprising:
- a chamber for supporting a workpiece;
- means for introducing a gas into said chamber;
- a coil of conductive material disposed on said chamber and including at least one generally flattened surface defined by straight parallel conductors, said generally flattened surface positioned to overlie and be generally parallel to said workpiece when said workpiece is supported in said chamber;
- and
- means for applying radio frequency energy to said coil.
A method of operating a plasma processing apparatus, said apparatus comprising a chamber for supporting a workpiece in a controlled pressure environment, and means for introducing a gas into said chamber, said method comprising the steps of:
- placing a coil of conductive material, said coil including at least one generally flattened surface defined by straight parallel conductors, onto said chamber such that said generally flattened surface is positioned to overlie and be parallel to said workpiece when said workpiece is supported in said chamber;
- and
- applying radio frequency energy to said coil.
Dependencies are inferred from the claim text.