Positive type photosensitive anionic electrodeposition coating resin composition

A positive type photosensitive anionic electrodeposition coating resin composition comprising:

• (a) a compound having a group unstable to acids;
• (b) a compound generating an acid when exposed to actinic light;
• and
• (c) at least one member selected from the compounds of the formulae (I) and (II):
• ##STR13## wherein R.sup.1 is a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group or an alkoxy group;
• R.sup.2 is a hydrogen atom, a hydroxyl group, an alkyl group, an ester group, a phenyl group or a group of the formula --X--R.sup.3 ;
• X is an unsubstituted alkylene group, an alkylene group substituted with a carboxyl group, a cycloalkylene group or an alkylene ether group;
• R.sup.3 is a hydroxyl group, an alkoxy group, a carboxyl group or a dialkylamino group;
• and n is an integer of 1 to 3, but when R.sup.2 is a group containing a carboxyl group, n may be 0;
• ##STR14## wherein R.sup.1 is as defined above;
• R.sup.4 is a hydrogen atom, an alkyl group or a phenyl group;
• and n is an integer of 1 to 3.