Dual sputtering source

A dual sputtering device comprising:

• a housing,
• two adjacent sputtering sections within said housing arranged along a common axis;
• each said section having a ring magnet circumscribed around said axis and a pole magnet, the center of which generally extends along said axis;
• said ring magnets being axially spaced from each other;
• said pole magnets being axially spaced from each other and each being surrounded by a respective one of said ring magnets;
• a generally annular space between each said pole magnets and a respective one of said ring magnets;
• each section having a target extending in a plane which is generally perpendicular to the said axis;
• said targets being axially spaced from each other and being located on the outer surface of said housing at opposite axial ends of said housing;
• said housing having fluid inlet means and fluid outlet means;
• passage means connecting said generally annular space of one section with said generally annular space of the other section, said passage means being annular and co-extensive with and located between said generally annular spaces of said sections;
• said fluid inlet means opening into said passage means upstream of fluid flow and said fluid outlet means opening into said passage means downstream of fluid flow whereby fluid entering said housing through said inlet means will circulate through said passage means and said annular spaces and out of said housing through said outlet means;
• and electrical means connected to said targets for creating electric fields across said targets upon activation of said electrical means.