Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method

A pattern forming method, comprising

• (i) applying a pattern forming material on a substrate;
• (ii) forming a film of a pattern forming contrast enhancing material on said pattern forming material, said pattern forming contrast enhancing material comprising the following ingredients in admixture:
• (a) from 1 to 3 parts by weight of a water soluble photosensitive compound selected from the group consisting of a water soluble aliphatic photosensitive compound (excluding ring compounds) having one or more of the group expressed by the formula (I), an aliphatic photosensitive quaternary ammonium salt having one or more of the group expressed by the formula (I), an aromatic photosensitive quaternary ammonium salt having one or more of the group expressed by the formula (I), and a photosensitive pyridinium salt having one or more of the group expressed by the formula (I);
• (b) 1 part by weight of a water soluble resin;
• and (c) water;
• ##STR74## (iii) effecting imagewise exposure using a KrF excimer laser beam;
• and (iv) effecting development using an aqueous alkaline solution
• to remove all the contrast enhancing material and the soluble non-image portion of the pattern forming material.