Methods for treating substrates by applying a halogenated hydrocarbon thereto
AssigneeAsahi Glass Company, Limited
InventorsTeruo Asano, Naohiro Watanabe, Kazuki Jinushi, Shunichi Samejima
Life of this patent
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Abstract
A solvent consisting essentially of a compound of the formula: CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I) wherein a+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z.ltoreq.3.
Claims11
A method for dry cleaning a substrate which comprises applying to said substrate a compound of the formula:
- CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub. F.sub.z(I)
- wherein a+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method for removing a buffing agent from a substrate which comprises applying to said substrate a compound of the formula
- CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I)
- wherein a+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method for removing a flux from a substrate, which comprises applying to said substrate a compound of the formula:
- CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I)
- wherein a+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method for rinsing a substrate which comprises applying to said substrate a compound of the formula:
- CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I)
- wherein A+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method for developing a resist, which comprises applying to said resist a compound of the formula
- CH.sub.2 Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I)
- wherein a+b+=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method for removing resist from a substrate, which comprises applying to said resist a compound of the formula:
- CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I)
- wherein a+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method for removing deposited water from a substrate, which comprises applying to said substrate a compound of the formula:
- CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I)
- wherein a+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method for extracting nicotine, which comprises contacting a nicotine containing tobacco preparation with a compound of the formula:
- CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I)
- wherein a+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method for diluting a perfluoroalkyl group-containing which comprises adding to said polymer a diluting amount of a compound of the formula:
- CH.sub.a Cl.sub.b F.sub.c CF.sub.2 CH.sub.x Cl.sub.y F.sub.z(I)
- wherein a+b+c=3, x+y+z=3, a+x.gtoreq.1, b+y.gtoreq.1, and 0.ltoreq.a, b, c, x, y, z, .ltoreq.3.
A method as in claim 10, wherein a composition is used comprising from 10 to 90% by weight of said compound of claim 20, from 10 to 80% by weight of an organic solvent selected from the group consisting of a hydrocarbon, an alcohol, a ketone, a chlorinated hydrocarbon, an ester and an aromatic compound, and from 0 to 10% by weight of a surfactant.
Dependencies are inferred from the claim text.