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US 5,262,651 AGranted
Positron beam lithography
AssigneeTexas Instruments Incorporated
InventorsKeith Bradshaw, Gary A. Frazier
Life of this patent
Estimating the term…
Abstract
Resist (402) is exposed by a beam of positrons (320) in an apparatus (300) similar to an electron beam lithography machine.
Claims17
A lithography apparatus, comprising:
- (a) a substrate support;
- (b) a source of annihilative particles;
- and
- (c) lenses for focussing said annihilative particles into a beam for patterning a substrate on said support.
1 more element
A lithography apparatus, comprising:
- (a) a source of annihilative particles;
- (b) lenses to focus said particles into a beam;
- (c) a beam blanker to deflect said beam;
- (d) a table for holding a substrate;
- and
- (e) deflection coils to scan said beam across said substrate wherein said beam patterns said substrate.
3 more elements
Dependencies are inferred from the claim text.