CVD apparatus comprising exhaust gas condensation means

Chemical vapor deposition apparatus, comprising:

• (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating wit the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region,
• (b) means for supporting the substrate in the coating region,
• (c) means for heating the substrate to an elevated reaction temperature, and
• (d) an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is reduced enough to condense excess, unreacted gaseous reactant from the spent gas stream before the spent gas stream enters said outlet means.

Chemical vapor deposition apparatus, comprising:

• (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region,
• (b) means for supporting the substrate in the coating region,
• (c) means for heating the substrate to an elevated reaction temperature, and
• (d) condensing means comprising an apertured condensing structure disposed in the exhaust region and an enclosure disposed about the condensing structure, said enclosure including an upper tubular member disposed about the condensing structure and having an open lower end and including a collection member spaced beneath the tubular member so as to provide a peripheral opening therebetween through which the spent gas stream is directed from the coating region to flow through the condensing structure to condense excess, unreacted gaseous reactant from the spent gas stream before it enters the outlet means, said collection member collecting any condensed gaseous reactant falling from the condensing structure.

Chemical vapor deposition apparatus, comprising:

• (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region,
• (b) conduit means extending through the exhaust region to the coating region and communicating to said inlet means for supplying the gaseous reactant stream thereto,
• (c) means for supporting the substrate in the coating region,
• (d) means for heating the substrate to an elevated reaction temperature, and
• (e) an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is reduced enough to condense excess, unreacted gaseous reactant from the spent gas stream before the spent gas stream enters said outlet means, said condensing structure including a central opening for receiving said conduit means.

Chemical vapor deposition apparatus, comprising:

• (a) a reactor having a chamber with an aluminizing coating region for forming an aluminide coating on a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous aluminum bearing reactant stream therein for passing over the heated substrate to react therewith to form the aluminide coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region,
• (b) means for supporting the substrate in the aluminizing coating region,
• (c) means for heating the substrate to an elevated reaction temperature, and
• (d) means disposed in the exhaust region for condensing excess, unreacted gaseous reactant from the spent gas stream before entering the outlet, said condensing means including an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is sufficiently low to condense the excess, unreacted gaseous reactant therefrom.