# US 5,260,580 A · Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 5,260,580 A - Document ID: US5260580A - Status: Granted - Kind: A - Application number: 07/941,786 - Filed: 1992-09-08 - Granted: 1993-11-09 - Earliest claimed: 1991-09-18 - Assignees: Canon Kabushiki Kaisha - Inventors: Hirohito Itoh; Shinji Ohishi - Web page: https://patentgrep.com/patent/US5260580A ## CPC - G03F 7/70716: {Stages} - G03F 7/70725: {control} - G03F 7/709: {Vibration, e.g. vibration detection, compensation, suppression or isolation} - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - H10P 72/57: {Mask-wafer alignment} - H01J 2237/20228: Mechanical X-Y scanning - H01J 2237/20278: Motorised movement - H01J 2237/3175: Lithography - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A movable stage device, which has a stationary base, a movable stage and a linear motor, further includes a second linear motor which serves as a second driving device for imparting thrust to the movable stage and which is attached to the movable stage through the intermediation of an attachment plate Both ends of a row of second drive coils are supported above the floor by support plates, which are independent of the stationary base and directly support the row of second drive coils above the floor in such a manner as to provide high rigidity, thereby attaining an improvement in speed and accuracy of positioning and avoiding a waste of energy. ## Claims ### Claim 1 A stage device, comprising: first support means; a stationary base supported by said first support means; guide means provided on said stationary base; a movable stage supported by said stationary base and said guide means; first driving means for imparting thrust to said movable stage and which is provided on said stationary base; second driving means for imparting thrust to said movable stage and which is separate from said first driving means; and second support means for supporting said second driving means and which is independent of said stationary base. ### Claim 2 (depends on 1) A stage device according to claim 1, wherein said first driving means comprises first switching means for switching between transmission and non-transmission of force between said first driving means and said movable stage, and wherein said second driving means comprises second switching means for switching between transmission and non-transmission of force between said second driving means and said movable stage. ### Claim 3 (depends on 1) A stage device according to claim 1, wherein said second support means has a rigidity higher than that of said first support means at least with respect to a driving direction of said second driving means. ### Claim 4 (depends on 1) A stage device according to claim 1, further comprising control means for controlling only said second driving means to impart thrust to said movable stage for a speed control operation requiring a large thrust and for controlling only said first driving means to impart thrust to said movable stage for a position control operation not requiring a large thrust. ### Claim 5 (depends on 4) A stage device according to claim 4, wherein said control means further comprises means for controlling both first and second driving means to impart thrust to said movable stage when said movable stage starts to vibrate. ### Claim 6 (depends on 1) A stage device according to claim 1, wherein each of said guide means, first driving means, second driving means, and second support means is provided in correspondence with both X- and Y-directions, and said movable stage being moved two-dimensionally in the X- and Y-directions. ### Claim 7 An exposure apparatus including a stage device, comprising: a radiation source for generating radiation for exposure; optical means for irradiating a mask with radiation emitted from said radiation source to transfer a mask pattern onto an object to be exposed; and a stage device for adjusting a relative positional relationship between said mask and the object to be exposed, said stage device comprising: first support means; a stationary base supported by first support means; guide means provided on said stationary base; a movable stage supported by said stationary base and said guide means; first driving means for imparting thrust to said movable stage and which is provided on said stationary base; second driving means for imparting thrust to said movable stage and which is separate from said first driving means; and second support means for supporting said second driving means and which is independent of said stationary base. ### Claim 8 (depends on 7) An exposure apparatus according to claim 7, wherein each of said guide means, first driving means, second driving means, and second support means is provided in correspondence with both X- and Y-directions, and said movable stage being movable two-dimensionally in the X- and Y-directions. ### Claim 9 (depends on 8) An exposure apparatus according to claim 8, wherein said mask pattern is a circuit pattern for a semiconductor device and wherein said object to be exposed is a wafer. ### Claim 10 A stage device for use in a semiconductor device manufacturing method that includes the steps of adjusting a relative positional relationship between a mask having a circuit pattern and a wafer by means of a stage device, and irradiating the mask with radiation to transfer the circuit pattern onto the wafer through exposure, said stage device comprising: first support means; a stationary base supported by said first support means; guide means provided on said stationary base; a movable stage supported by said stationary base and said guide means; first driving means for imparting thrust to said movable stage and which is provided on said stationary base; second driving means for imparting thrust to said movable stage and which is separate from said first driving means; and second support means for supporting said second driving means and which is independent of said stationary base. ### Claim 11 (depends on 10) A stage device for used in a semiconductor device manufacturing method according to claim 10, wherein said adjusting and irradiating steps are repeated to transfer the circuit pattern onto each of a plurality of wafer regions. ### Claim 12 A semiconductor device manufactured by a manufacturing method that includes the steps of adjusting a relative positional relationship between a mask having a circuit pattern and a wafer by means of a movable stage device, and irradiating the mask with radiation to transfer the circuit pattern onto the wafer through exposure, wherein the adjusting step further comprises the steps of: supporting a stationary base with first support means; providing guide means on the stationary base; supporting the movable stage with the stationary base and the guide means; driving the movable stage with first driving means which imparts thrust to the movable stage and which is provided on the stationary base; driving the movable stage with second driving means which imparts thrust to the movable stage and which is separate from the first driving means; and supporting the second driving means with second support means which is independent of the stationary base. ### Claim 13 (depends on 12) A semiconductor device according to claim 12, wherein said adjusting and irradiating steps are repeated to transfer the circuit pattern onto each of a plurality of wafer regions. ### Claim 14 A semiconductor device manufacturing method that includes the steps of adjusting a relative positional relationship between a mask having a circuit pattern and a wafer by means of a movable stage, and irradiating the mask with radiation to transfer the circuit pattern onto the wafer through exposure, said method comprising the steps of: supporting a stationary base with a first support means; providing guide means on the stationary base; supporting the movable stage with the stationary base and the guide means; driving the movable stage with first driving means which imparts thrust to the movable stage and which is provided on the stationary base; driving the movable stage with second driving means which imparts thrust to the movable stage and which is separate from the first driving means; and supporting the second driving means with second support means which is independent of said stationary base. ### Claim 15 (depends on 14) A semiconductor device manufacturing method according to claim 14, wherein said adjusting and irradiating steps are repeated to transfer the circuit pattern onto each of a plurality of wafer regions.