Method of manufacturing a thin-film pattern on a substrate
AssigneeHitachi, Ltd.
InventorsKazuhiro Kuwabara, Yuji Mori, Yoshiro Mikami
Life of this patent
Estimating the term…
Abstract
Disclosed is an improvement in a thin-film pattern manufacturing method which includes the steps of providing a thin film on a substrate, forming a mask having a desired pattern on the thin film, and patterning the thin film by removing an exposed portion of the thin film by etching. According to the improvement, the mask is manufactured by forming a layer of an organic resin on the thin film on the substrate and by forming the organic resin layer in the desired pattern by a mechanical forming member. In another embodiment, the organic resin is directly formed or moulded on the thin film by a forming or moulding member.
Claims26
A method of manufacturing a thin-film pattern, said method including the steps of providing a thin film on a substrate, forming a mask having a desired pattern on the thin film, and patterning the thin film by removing an exposed portion of the thin film by etching,
- wherein said step of forming the mask pattern includes the steps of:
- forming a layer of an organic resin on the thin film on the substrate;
- and
- forming the organic resin layer in the desired pattern by pressing against the organic resin layer a forming surface of a forming member, the forming surface having projections and recesses arranged in substantially the same pattern as the mask pattern.
A method of manufacturing a thin-film pattern, said method including the steps of providing a thin film on a substrate, forming a mask having a desired pattern on the thin film, and patterning the thin film by removing an exposed portion of the thin film by etching,
- wherein said step of forming the mask pattern includes the steps of:
- disposing a cylindrical forming member adjacent the thin film on the substrate, said cylindrical forming member having a peripheral surface which forms a forming surface having projections and recesses arranged in substantially the same pattern as the mask pattern, said cylindrical forming member having substantially the same axial length as a width of the thin film on the substrate;
- rotating the thus disposed forming member;
- causing a relative movement between the forming member and the substrate on which the thin film is formed;
- and
- supplying an organic resin which is not yet set onto a portion of the thin film on the substrate which is located upstream of the forming member and forming the supplied organic resin by the forming surface of said forming member.
A method of manufacturing a thin-film pattern, said method including the steps of providing a thin film on a substrate, forming a mask having a desired pattern on the thin film, and patterning the thin film by removing an exposed portion of the thin film by etching,
- wherein said step of forming the mask pattern includes the steps of:
- disposing a cylindrical forming member adjacent the thin film on the substrate, said cylindrical forming member having a peripheral surface which forms a forming surface having projections and recesses arranged in substantially the same pattern as the mask pattern, said cylindrical forming member having substantially the same axial length as a width of the thin film on the substrate;
- rotating the thus disposed forming member;
- causing a relative movement between the forming member and the substrate on which the thin film is formed;
- supplying an organic resin which is not yet set onto the forming surface of said forming member and moulding the supplied organic resin by the forming surface of said forming member;
- and
- transferring the thus moulded organic resin onto the thin film on the substrate.
A method of forming a mask pattern, comprising the steps of:
- forming a layer of an organic resin on a substrate;
- and
- forming the organic resin layer into the mask pattern on the substrate by pressing against the organic resin layer a forming surface of a forming member, the forming surface having projections and recesses arranged in substantially the same pattern as the mask pattern.
A method of manufacturing a mask pattern, comprising the steps of:
- disposing a forming member adjacent a substate, said forming member having a forming surface with projections and recesses arranged in substantially a same pattern as the mask pattern;
- supplying an organic resin which is not yet set onto the forming surface of said forming member and moulding the supplied organic resin by the forming surface of the forming member;
- and
- transferring the thus moulded organic resin onto the substrate.
Dependencies are inferred from the claim text.