Machining oxide thin-films with an atomic force microscope: pattern and object formation on the nanometer scale
AssigneePresident and Trustees of Harvard College
InventorsCharles M. Lieber, Yun Kim
Life of this patent
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Abstract
An atomic force microscope (AFM) has been used to machine complex patterns and to form free structural objects in thin layers of MoO.sub.3 grown on the surface of MoS.sub.2. The AFM tip can pattern lines with .ltoreq.10 nm resolution and then image the resulting structure without perturbation by controlling the applied load. Distinct MoO.sub.3 structures can also be defined by AFM machining, and furthermore, these objects can be manipulated on the MoS.sub.2 substrate surface using the AFM tip. These results suggest application to nanometer scale diffraction gratings, high-resolution lithography masks, and possibly the assembly of nanostructures with novel properties.
Claims1
A method for machining oxide thin-films, comprising the steps of:
- a) employing an atomic force microscope to pattern lines on the oxide thin film;
- and
- b) imaging a resulting structure by controlling an applied load of a tip of the atomic force microscope.
Dependencies are inferred from the claim text.