Plasma-activated chemical vapor deposition of fluoridated cyclic siloxanes
AssigneeDow Corning Corporation
InventorsGerardo Caporiccio, Riccardo D'Agostino, Pietro Favia
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Abstract
The present invention refers to coatings produced by means of the deposit of thin films formed by plasma-activated chemical vapor deposition of volatile fluoridated cyclic siloxanes having the structure [RR'SiO].sub.x, where R is an alkyl group with 1-6 carbon atoms, R' is a fluorinated alkyl group with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4. These particular coatings are useful because of their properties of protection and insulation.
Claims10
A method for the formation of a coating on a substrate comprising:
- introducing a sufficient quantity of vapor into a chamber containing the substrate, wherein the vapor comprises a fluorinated cyclic siloxane with the structure [RR'SiO].sub.x in which R is a hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4;
- and
- exposing the vapor in the chamber to a radio frequency plasma discharge to cause reaction of the vapor and, thereby, deposition of the coating on the substrate.
Dependencies are inferred from the claim text.