Cluster tool dry cleaning system
AssigneeSubMicron Systems, Inc.
InventorsRobert W. Grant, Richard E. Novak
Life of this patent
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Abstract
A cluster tool module for dry process cleaning of substrates. A substrate process reactor body assembly includes a gas inlet and gas outlet on opposing sides of a ceramic reactor body. A linear xenon flash lamp in a light bar provides a UV source for uniform distribution over a substrate by use of a light filter. Infrared heating is also provided by a plurality of infrared lamps in the light box. A moisturizer is provided for safe introduction of water vapor into the gas flow.
Claims4
Cluster tool dry cleaning system comprising:
- a. a ceramic reactor body including a gas inlet, a gas outlet and wafer orifice;
- b. a light box over said ceramic reactor body;
- c. a light source means in said light box;
- and,
- d. means for supporting and rotating a wafer or substrate in said body.
Cluster tool dry cleaning system comprising:
- a. a ceramic reactor body including a gas inlet, a gas outlet and wafer orifice;
- b. a light box over said ceramic reactor body;
- c. a UV source means in said light box;
- d. an IR source means in said light box;
- e. a moisturizing means;
- and,
- f. means for supporting and rotating a wafer or substrate in said body.
Cluster tool dry cleaning system comprising:
- a. a small ceramic reactor body including a gas inlet, a gas outlet and wafer orifice;
- b. a light box over said ceramic reactor body;
- c. a UV source means in said light box;
- d. an IR source means in said light box;
- e. a moisturizing means;
- and,
- f. means for supporting and rotating a wafer or substrate.
Dependencies are inferred from the claim text.