Laser etch-back process for forming a metal feature on a non-metal substrate
AssigneeMotorola, Inc.
InventorsTheodore G. Tessier, John W. Stafford, William F. Hoffman
Life of this patent
Estimating the term…
Abstract
An improved laser etch-back process forms a metal feature on an area of a polymeric or other non-metallic substrate. The process comprises forming a metal layer on the area that includes a first, relatively thick section, and a second, relatively thin section. Thereafter, the metal layer is uniformly irradiated with a laser pulse, but not to vaporize metal from the thick section. Thus, the laser pulse selectively etches the thin section to remove the metal and expose the substrate, without disturbing the thick section, which forms the desired metal feature.
Claims27
A laser etch-back process for forming a metal feature on an area of a non-metallic substrate, said process comprising
- applying a metal layer to the area, said metal layer comprising a first section having a first thickness and said second section having a second thickness substantially less than said first thickness, and
- irradiating the metal layer with a laser pulse such that the pulse uniformly irradiates the first section and the second section and is effective to heat the second section to vaporize the metal without vaporizing metal from the first section, whereby said second section is vaporized to expose the substrate and further whereby the first section survives said irradiation to form the metal feature.
A laser etch-back process for forming a metal feature on an area of a polymeric substrate, said area comprising a first region and a second region, said process comprising
- applying a continuous metal layer to substantially cover the area, said layer comprising a first section overlying a first region of the area and having a thickness of at least about 2.5 microns and a second section overlying a second region of the area and having a thickness less than about 0.6 microns, and
- uniformly irradiating the metal layer with a laser pulse to heat the metal layer, said pulse having a uniform fluence effective to heat the second section to a temperature sufficient to vaporize the metal but not sufficient to heat the first section to vaporize the metal, said irradiation continuing for a time sufficient to vaporize metal from the second section to expose the substrate.
A laser etch-back process for forming a copper trace on a polymeric substrate, said substrate including an area comprising a first region and a second region such that the trace overlies the first region and is bounded by the second region whereat said substrate is exposed, said process comprising
- depositing a thin metal film having a uniform thickness onto the substrate such that the film substantially covers the area,
- selectively electrodepositing a copper plate onto the film overlying the first region to form a metal layer comprising a thick section overlying said first region and a thin section formed by said film overlying the second region, and
- irradiating the metal layer with a laser beam such that the beam uniformly irradiates the thick section and the thin section, said beam having a fluence sufficient to heat the thin section to a temperature effective to vaporize the metal and thereby expose the substrate thereat, but not to vaporize metal at the thick section to thereby produce said trace.
A laser etch-back process for forming a predominantly copper trace on planar surface of a polymeric substrate, said surface comprising an area that includes a first region and a second region such that the trace is formed on said first region and is adjacent to the second region whereat said substrate is exposed, said process comprising
- depositing a metal coating onto the substrate such that the coating covers the area, said coating comprising an outermost copper film and having a thickness less than about 0.6 micron,
- applying a polymeric mask onto the substrate to overlie the metal coating, said mask covering the second region and having openings at said first region whereat the copper film is exposed,
- immersing the masked substrate into an electroplating bath containing a reducible copper ion, while cathodically biasing the metal coating to reduce the copper ion to deposit a metallic copper plate onto the copper film through the openings in the mask, whereby the copper plate cooperates with the metal coating to form a metal layer comprising a thick section at the first region that includes the copper plate and has a thickness greater than about 2.5 microns and a thin section at the second region derived from the metal coating underlying the mask,
- removing said polymeric mask from the substrate to expose the thin section, and
- irradiating the metal layer with a laser pulse such that the laser pulse uniformly irradiates the first section and the second section, said laser pulse having a uniform fluence between about 200 and 600 millijoules per square centimeter and effective to heat said second section to a temperature sufficient to vaporize the metal to expose the substrate, the first section dissipating heat generated by the laser beam to maintain a temperature less than the metal vaporization temperature, whereby the thick section survives the irradiation to form the copper trace.
A laser etch-back process for forming a predominantly copper trace on a planar surface of a polyimide substrate, said surface comprising an area that includes a first region and a second region such that the trace is formed on said first region and is adjacent to the second region whereat said substrate is exposed, said process comprising
- sputtering a dual metal coating onto the substrate such that the coating substantially covers the surface, said coating comprising a chromium film immediately adjacent the polyimide substrate and an outermost copper film, said coating having a thickness less than about 0.6 micron,
- applying a polymeric mask onto the substrate to overlie the metal coating, said mask covering the second region and having openings at said first region whereat the copper film is exposed,
- immersing the masked substrate into an aqueous electroplating bath containing a reducible copper ion, while cathodically biasing the metal coating to reduce the copper ion to deposit a metallic copper plate onto the copper film through the openings in the mask, whereby the copper plate cooperates with the metal coating to form a metal layer comprising a thick section at the first region that includes the copper plate and has a thickness between about 3.0 and 4.0 microns and a thin section at the second region derived from the metal coating underlying the mask,
- removing said polymeric mask from the substrate to expose the thin section,
- depositing a chromium coating having a substantially uniform thickness onto the copper layer to form a coated layer, and
- irradiating the coated layer at said area with one or more laser pulses produced by an excimer laser apparatus, said area being irradiated such that the laser pulse uniformly irradiates the first section and the second section, and has a uniform between about 250 and 350 millijoules per square centimeter, said pulses being effective to heat said second section to a temperature sufficient to vaporize the metal to expose the substrate, the first section dissipating heat generated by the laser pulse to maintain a temperature less than the metal vaporization temperature, whereby the thick section survives the irradiation to form the copper trace.
Dependencies are inferred from the claim text.