Apparatus and a method for high numerical aperture microscopic examination of materials
AssigneeInternational Business Machines Corporation
InventorsJohn S. Batchelder, Philip C. D. Hobbs, Marc A. Taubenblatt
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AssigneeInternational Business Machines Corporation
InventorsJohn S. Batchelder, Philip C. D. Hobbs, Marc A. Taubenblatt
Estimating the term…
Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer. The optical device may either be a prism or a plano-convex lens. The plano-convex lens may be held in contact with the wafer or separated from the wafer via an air bearing or an optical coupling fluid to allow the sample to be navigated beneath the lens. The lens may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.
An interferometer useful in examining a sample semiconductor wafer having a front surface which includes features and a substantially featureless back surface and having an index of refraction greater than unity, said interferometer comprising:
A Raman spectrometer useful in examining a sample semiconductor wafer having a flat back surface and having an index of refraction greater than unity, said Raman spectrometer comprising:
An absorption spectrometer useful in examining a sample semiconductor wafer having a flat back surface and having an index of refraction greater than unity, said absorption spectrometer comprising:
Dependencies are inferred from the claim text.