III-V solar cells and doping processes
AssigneeThe Boeing Company
InventorsLewis M. Fraas, Veeravana S. Sundaram, James E. Avery, Peter E. Gruenhaum, Eric Malocsay
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AssigneeThe Boeing Company
InventorsLewis M. Fraas, Veeravana S. Sundaram, James E. Avery, Peter E. Gruenhaum, Eric Malocsay
Estimating the term…
Zinc diffusion procedures applicable for large scale manufacture of GaAs and GaSb cells used in tandem solar cells having a high energy conversion efficiency. The zinc doping and carrier concentration are restricted to be less than about 10.sup.19 /cm.sup.3 to obtain good light generated carrier collection and hence good short circuit currents. The amount of zinc that is available for diffusion during a drive-in heating step is restricted. Confinement of zinc and arsenic vapors during the heating step may be effected by use of a proximity source wafer or by an encapsulant layer. The zinc diffusion of GaSb is obtained by a homogeneous light diffusion that is followed by a patterned heavy diffusion to give low ohmic contact with the grid lines. Texture etching of the GaSb solar cell is also compatible with this diffusion process.
A solar concentrator module comprising:
A GaAs/GaSb tandem solar cell having high conversion efficiency, comprising:
A GaSb solar cell having:
A method for making a diffused junction III-V wafer, comprising the steps of:
A method for doping a III-V solar cell wafer to provide a non-uniform doping profile comprising:
An intermediate product for use in producing a GaAs solar cell comprising a GaAs wafer having a layer with a predetermined amount of a conductivity modifier that has been applied on an upper surface thereof with the number of atoms of the conductivity modifier being less than are required to produce a monolayer, and a covering layer of insulative material on the upper surface of the metal oxide effective to confine vapors of said conductivity modifier at temperatures up to about 725.degree. C.
A method of making a diffused junction III-V wafer having grid electrode lines, comprising the steps of:
A method for producing a front side grid electrode on a III-V wafer, comprising the steps of:
A method of making a diffused junction GaSb wafer having an emitter with a texture etched surface, comprising the steps of:
An n-type GaAs wafer suitable for use in a solar cell when modified to form a photoactive emitter junction through diffusion of a conductivity modifier into a portion of the wafer, a predetermined volume of a removable film deposited over one surface of the wafer, the film including a predetermined concentration of the conductivity modifier such that the volume contains fewer atoms of the conductivity modifier than would be sufficient to form a monolayer of atoms of the conductivity modifier on the surface, and removable encapsulating means to reduce loss of the conductivity modifier from the film other than by diffusion of the conductivity modifier into the wafer.
A tandem solar cell concentrator module comprising:
A texture etched GaSb booster cell for use in a tandem concentrator module comprising a double since diffused GaSb wafer, grid lines on the wafer with the concentration of zinc immediately under the grid lens higher than the concentration between grid lines, and a series of grooves to texture the light-receiving surface of the booster to reduce its reflections, further comprising a backside metallization of indium tin oxide on the GaSb, titanium, tungsten nitride over the indium tin oxide, and silver or gold over the titanium tungsten nitride to define the bottom exposed surface.
Dependencies are inferred from the claim text.