Apparatus and method for patterning a film
AssigneeMinnesota Mining and Manufacturing Company
InventorClyde D. Calhoun
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AssigneeMinnesota Mining and Manufacturing Company
InventorClyde D. Calhoun
Estimating the term…
The present invention relates to an apparatus and method for patterning areas of a radiation absorbent film material. In the preferred embodiment, the film material is at least partially electrically conductive. The radiation is focused onto the film by a lenticular lens having a plurality of optically active elements to provide a radiation pattern on the film and remove or displace portions of the film to form a corresponding pattern, preferably a conductive pattern. The film may have one or more layers or regions, but at least one region must be radiation absorbent in order to allow the formation of patterns in the film in accordance with the present invention. The areas of the film affected by the phenomenon of radiation absorption are non-conductive voids which may separate the film into a plurality of conductive grid lines whereby the film is useful with a conductive lens film to increase the apparent efficiency of a photovoltaic cell.
A patterned sheet comprising a radiation absorbent layer containing multiple discontinuities extending transversely through the plane of said layer and wherein said radiation absorbent layer is confined between adjacent, radiation transparent layers, said radiation absorbent layer comprising both absorbent and reflective materials arranged so that the absorbent material receives incident radiation wherein at least one of said radiation transparent layers is a lenticular lens having fields of focus which lie at least partially within the plane of said absorbent layer and wherein the fields of focus of said lens correspond to the area of discontinuity of said absorbent layer.
A photovoltaic device comprising
A conductive sheet, comprising:
A method for patterning a radiation absorbent film comprising the following steps:
Dependencies are inferred from the claim text.