Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for the manufacturing of the coating

An anti-reflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• wherein said third layer comprises oxides selected from the group including:
• SnO.sub.x, x is equal to or less than 2, ZrO.sub.2, ZnO, Ta.sub.2 O.sub.5, Nicro-oxide, TiO.sub.2, Sb.sub.2 O.sub.3, In.sub.2 O.sub.3 and mixed oxides from oxides of this group.

An anti-reflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• wherein said fourth layer comprises nitrides selected from the group TiN.sub.x, where x is equal to or greater than 1, and ZrN.

An anti-reflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• wherein said fifth layer comprises MgF.sub.2.

An anti-reflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• wherein said layer system further comprises an adhesive layer arranged between said first layer and said second layer.

An anti-reflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• wherein said first layer comprises NiCr-suboxide functioning also as an adhesive.

An anti-reflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• wherein said layer system is applied to a substrate composed of glass, and wherein said first layer has a thickness of 170 angstrom .+-.20%;
• said second layer has a thickness of 170 angstrom .+-.20%;
• said third layer has an optical thickness of 5550/4 angstrom .+-.20%;
• said fourth layer has a thickness of 110 angstrom .+-.20%;
• and said fifth layer has an optical thickness of 5550/4 angstrom .+-.10%;
• such layer thicknesses selected with the cited thickness tolerances taking into account the interdependence between the layer thicknesses and materials selected for the layers.

An anti-reflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• and
• further comprising a backside layer, applied to a back side of the substrate not facing the observer, said backside layer comprising TiN.sub.x, X is equal to or greater than 1.

A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an anti-reflective effect, comprising the following steps:

• on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide;
• apply a second layer covering said first layer comprising TiN.sub.x, where x is equal to or greater than 1;
• apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide;
• apply a fourth layer covering said third layer, comprising TiN.sub.x, where x is equal to or greater than 1;
• apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide;
• wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron.

A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:

• on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide;
• apply a second layer covering said first layer comprising nitride;
• apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide;
• apply a fourth layer covering said third layer, comprising nitride;
• apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide;
• wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron;
• wherein the substrate is composed of glass, and wherein at least one of said layers is generated composed of SnO.sub.x, x is equal to or less than 2, via reactive sputtering from a Sn target with said magnetron, in the presence of a sputtering gas mixture comprising Ar and O.sub.2, using a pressure of approximately 5.times.10.sup.-3 mbar.

A method for manufacturing a coating for an optically effective layer system for substrate, the coating having an antireflective effect, comprising the following steps:

• on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide;
• apply a second layer covering said first layer comprising nitride;
• apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide;
• apply a fourth layer covering said third layer, comprising nitride;
• apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide;
• wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron;
• wherein the substrate is composed of glass, and wherein a layer is generated composed of SiO.sub.2, by reactive sputtering from an Si-target with said magnetron, in the presence of a sputtering gas mixture comprising Ar and O.sub.2, using a pressure of approximately 5.times.10.sup.-3 mbar.

A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:

• on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide;
• apply a second layer covering said first layer comprising nitride;
• apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide;
• apply a fourth layer covering said third layer, comprising nitride;
• apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide;
• wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron;
• wherein the substrate is composed of glass, and wherein a layer is generated composed of Al.sub.2 O.sub.3, via reactive sputtering from an Al-target with said magnetron, in the presence of a sputtering gas mixture comprising Ar and O.sub.2, using a pressure of approximately 5.times.10.sup.-3 mbar.

A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:

• on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide;
• apply a second layer covering said first layer comprising nitride;
• apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide;
• apply a fourth layer covering said third layer, comprising nitride;
• apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide;
• wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron;
• wherein the substrate is composed of glass, and wherein a layer is generated composed of TiN.sub.x, x is equal to or greater than 1, via reactive sputtering from a Ti-target with said magnetron, in the presence of a sputtering gas mixture comprising Ar and N.sub.2, using a pressure of approximately 5.times.10.sup.-3 mbar.

A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:

• on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide;
• apply a second layer covering said first layer comprising nitride;
• apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide;
• apply a fourth layer covering said third layer, comprising nitride;
• apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide;
• wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron;
• wherein a plasma-supported chemical vapor deposition method is employed.

A method for manufacturing a coating for an optically effective layer system for substrates, the coating having an antireflective effect, comprising the following steps:

• on a side of the substrate which faces an observer, apply a first layer functioning as a dielectric and comprising metal oxide;
• apply a second layer covering said first layer comprising nitride;
• apply a third layer covering said second layer, functioning as a dielectric and comprising metal oxide;
• apply a fourth layer covering said third layer, comprising nitride;
• apply a fifth layer covering said fourth layer, functioning as a dielectric, and comprising metal oxide;
• wherein said layers are applied using a DC-reactive sputtering method from targets with a magnetron;
• wherein a pyrolyse method is employed.

An antireflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• wherein said first layer comprises oxides selected from the group including:
• SnO.sub.x, x is equal to 2, ZrO.sub.2, ZnO, Ta.sub.2 O.sub.5, NiCr-oxide, TiO.sub.2 Sb.sub.2 O.sub.3, In.sub.2 O.sub.3, and mixed oxides from oxides of this group.

An antireflective layer system for substrates comprising:

• a first layer arranged on the substrate on a side of the substrate toward an observer, functioning as a dielectric and comprising metal oxide;
• a second layer arranged on said first layer, comprising nitride;
• a third layer arranged on said second layer, functioning as a dielectric and comprising metal oxide;
• a fourth layer arranged on said third layer, comprising nitride;
• and a fifth layer arranged on said fourth layer, functioning as a dielectric and comprising metal oxide;
• wherein said fifth layer has a surface resistance, on a surface facing the observer, of 100 to 400 ohm per square.