Process for producing electrically impervious anodized films on valve metals and product thereof
AssigneeThe Alta Group, Inc.
InventorsMathew Cooper, Harry Rosenberg
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Abstract
A method is disclosed for producing an anodized film on titanium, its alloys and other metals such that the film deposited will have a specific leak rate of less than one nanoamp per square centimeter at room temperature with an impressed electric field of at least five volts, where the anodization is performed in a solution consisting of liquid ortho-phosphoric acid of reduced water content in an aprotic solvent, and articles of manufacture therefrom.
Claims30
A process for anodizing a valve metal from the group consisting of titanium, aluminum, tantalum, niobium, zirconium, and titanium or their alloys, where the anodizing solution comprises an aprotic solvent and liquid ortho-phosphoric acid having a total water content including combined water, water of hydration and excess water content of 34 to 43 weight percent.
Dependencies are inferred from the claim text.