Etching of nanoscale structures
AssigneeE. I. Du Pont de Nemours and Company
InventorsEdward J. Delawski, Bruce A. Parkinson
Life of this patent
Estimating the term…
Abstract
A process for etching with an atomic force microscope using a two-dimensional metal chalcogenide as the substrate, is disclosed.
Claims13
A process for etching a nanoscale structure using an atomic force microscope comprising scanning the microscope tip over a two dimensional substrate of at least one metal chalcogenide at a force of from about 10.sup.-12 to about 10.sup.-6 newtons to generate the controlled ablation of one or more molecular layers of the metal chalcogenide.
A method for determining small deviations from stoichiometry comprising scanning with an AFM a substrate area of known size, counting the resulting nucleation sites, and subtracting the number of nucleation sites from the number of atoms scanned.
Dependencies are inferred from the claim text.