Acid labile dissolution inhibitors and positive- and negative-acting photosensitive composition based thereon

Abstract

Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy, R.sub.2 is hydrogen, alkyl, cycloalkyl or aryl, R.sub.3 is a saturated or unsaturated hydrocarbon radical, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, alkyl, alkoxy or aryloxy, and X is a direct single bond or a methylene or ethylene bridge. These compounds are especially suitable for the preparation of photoresist compositions which can be used both for the production of positive as well as negative images. The photoresists are preferably used for deep-UV microlithography.

Dependencies are inferred from the claim text.