Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
AssigneeShipley Company, L.L.C.
InventorsJames Thackeray, George W. Orsula, Roger Sinta
Life of this patent
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Abstract
A photoresist that utilizes a copolymer of a phenol and a cyclic alcohol having increased optical transmission properties relative to photoresists using fully aromatic phenolic resins. Preferred binders are hydrogenated novolak resins and hydrogenated polyvinyl phenol resins.
Claims20
An article of manufacture comprising a substrate with a photoresist composition coating layer, the photoresist composition comprising an admixture of a resin binder and a light sensitive component, the resin binder comprising a copolymer having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcohol units, said cyclic alcohol units being present in a concentration of less than 50 mole percent of the total of said binder and being insufficient to prevent development of an exposed coating of the photoresist in a developer for said photoresist, said light sensitive component being present in an amount capable of generating a latent image by imagewise exposure of the coating layer of said photoresist to activating radiation.
A method for forming a relief image, comprising:
- (a) applying a coating layer of a photoresist composition on a substrate, the photoresist composition comprising an admixture of a resin binder and a light sensitive component, the resin binder comprising a copolymer having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcohol units, said cyclic alcohol units being present in a concentration of less than 50 mole percent of the total of said binder and being insufficient to prevent development of an exposed coating of the photoresist in a developer for said photoresist, said light sensitive component being present in an amount capable of generating a latent image by imagewise exposure of the coating layer of said photoresist to activating radiation;
- (b) imagewise exposing the coating layer to activating radiation;
- and
- (c) developing the exposed coating layer to form a relief image.
Dependencies are inferred from the claim text.