Method for producing a specified zirconium-silicon amorphous oxide film composition by sputtering
AssigneeAsahi Glass Company, Limited
InventorsIchiro Makino, Akira Mitsui, Mikio Takehara, Eiichi Ando, Junichi Ebisawa, Koichi Suzuki, Kiyoshi Matsumoto, Toru Iseda, Susumu Suzuki
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Abstract
A magnetic recording medium comprising a magnetic recording layer and at least one protective layer formed on the recording layer, wherein the outermost protective layer on the side exposed to air is made of an oxide film.
Claims2
A method for producing an amorphous oxide film composed mainly of ZrB.sub.x O.sub.y, wherein the atomic ratio x of boron to zirconium is 0.1<x<2.3 and the atomic ratio y of oxygen to zirconium is 2<y<5.5, which comprises sputtering a target composed mainly of a substance comprising from 11 to 91 atomic % of zirconium, from 3 to 70 atomic % of boron, and from 0 to 67 atomic % of oxygen.
A method for producing an amorphous oxide film composed mainly of ZrB.sub.x Si.sub.z O.sub.y, wherein the atomic ratio x of boron to zirconium, the atomic ratio z of silicon to zirconium, and the atomic ratio y of oxygen to zirconium are 0.05.ltoreq.x+z<19 and 2<y<40 with the proviso that a layer wherein x+z-3>0 and x-3z+1>0 is excluded, which comprises sputtering a target composed mainly of a substance which satisfies 1<a<96, 1<b+c<95, and 0<d<67 with the proviso that a composition wherein a<0.25 (100-d) and c<0.25 (100-d) is excluded, wherein a is the atomic % of zirconium, b is the atomic % of boron, c is the atomic % of silicon, and d is the atomic % of oxygen.
Dependencies are inferred from the claim text.