Interference removal
AssigneeXinix, Inc.
InventorsHerbert E. Litvak, Steven C. Leach, Edward G. Rogers
Life of this patent
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Abstract
An improved method for minimizing interferences from random noise and correlated fluctuations which obscure electrical signals converted from optical emissions. In particular, an improved method for the removal of interferences from optical emission signals during endpoint determination in dry etching processes for the fabrication of microelectronic devices which derives information in the presence of random noise, correlated fluctuations and periodic modulations of the plasma by maximizing the signal to random noise ratio and minimizing the obscuring effects of correlated fluctuation.
Claims6
In an optical emission detection method which converts a self-emitted light emission intensity to a measurable electrical signal for monitoring a dry etch process for microfabrication an improved method for minimizing interferences comprising the steps of:
- (a) measuring said electrical signal in separate channels at two or more wavelengths employing a fiber optics bundle having two or more sets of fibers, with the fibers within said sets mixed to minimize any bias in the view of each fiber bundle;
- (b) normalizing the separate electrical signals from said separate channels;
- (c) analyzing said electrical signals for random noise, correlated fluctuations, and the dry process monitoring signal;
- (d) maximizing the signal to random noise ratio of the process monitoring signal;
- (e) minimizing the obscuring effects of correlated fluctuations from the separate channels by algorithms;
- thereby providing a resultant signal which is no longer obscured by random noise or correlated fluctuations.
Dependencies are inferred from the claim text.