Optical projection exposure method and system using the same
AssigneeNippon Telegraph and Telephone Corporation
InventorsSeitaro Matsuo, Yoshinobu Takeuchi, Kazuhiko Komatsu, Emi Tamechika, Katsuhiro Harada, Yoshiaki Mimura, Toshiyuki Horiuchi
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Abstract
According to this invention, illumination light for illuminating a mask on which a micropattern is drawn is inclined at an angle corresponding to a numerical aperture of an optical projection lens located below the mask with respect to an optical axis. The illumination light is obliquely incident on the mask to expose the micropattern on an object located below the optical projection lens.
Claims91
An optical projection exposure method of a micropattern, comprising the steps of inclining illumination light for illuminating a mask having the micropattern thereon by an angle corresponding to a numerical aperture of an optical projection lens located below said mask with respect to an optical axis, and causing the illumination light to be obliquely incident on said mask to expose the micropattern on an object located below said optical projection lens.
An optical projection exposure apparatus of a micropattern, comprising:
- a light source;
- a mask on which the micropattern is drawn;
- an optical projection lens located below said mask;
- and
- means for obliquely illuminating the micropattern on said mask with illumination light inclined at an angle corresponding to a numerical aperture of said optical projection lens with respect to an optical axis,
- wherein the illumination light is obliquely incident on said mask to expose the micropattern on an object located below said optical projection lens.
Dependencies are inferred from the claim text.