Method of secondary ion mass spectrometry analysis
AssigneeNEC Corporation
InventorTsutomu Tsuji
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Abstract
A method of secondary ion mass spectrometry analysis has been improved to make detection of the positive and the negative secondary ions within a short period of time and with a high sensitivity. This improved method utilizes an accelerated primary ion of a cesium oxide for selective irradiation to a specific region in the test specimen to sputter the specimen surface and to make a mass spectrometry analysis of emitted positive and negative secondary ions. In detecting the positive and the negative secondary ions, it is possible to change the polarity of one ion current detection electrode of a secondary ion mass spectrometer in turn or to use two ion current detection electrodes connected to a secondary ion mass spectrometer and applied to a positive and a negative potential, respectively.
Claims4
A method of secondary ion mass spectrometry analysis comprising steps of (a) sputtering the surface of a specimen to be analyzed with the use of a cesium oxide ion as a primary ion beam source and (b) analyzing by means of a secondary ion mass spectrometer intensities of positive and negative secondary ions emitted by the sputtering, said secondary ion mass spectrometer being provided with at least one secondary ion current detection electrode for selectively detecting the positive and the negative secondary ions emitted by the sputtering.
Dependencies are inferred from the claim text.