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US 5,208,209 AGranted
Fluoran compounds, process for preparation thereof and recording materials comprising said compound
AssigneeMitsui Toatsu Chemicals, Inc.
InventorsAtsuo Otsuji, Masakatsu Nakatsuka, Kiyoharu Hasegawa, Masatoshi Takagi, Akihiro Yamaguchi
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Abstract
Novel fluoran compounds represented by the formula (I): ##STR1## wherein R.sup.1 is an alkyl group having from 1 to 4 carbon atoms, preparation process of the fluoran compounds, and a heat-sensitive and a pressure-sensitive recording material comprising the fluoran compound, are disclosed.
Claims4
A recording material comprising the fluoran compound represented by the formula (I) ##STR6## wherein R.sup.1 is an alkyl group having from 1 to 4 carbon atoms.
Dependencies are inferred from the claim text.