Process for removing and/or structuring surfaces by irradiating with a light source
AssigneeABB Patent GmbH
InventorsHilmar Esrom, Ulrich Kogelschatz
Life of this patent
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Abstract
The process removes or partially structures the surface of a substrate of a polymer, i.e. polyamide, polyimide and polycarbonate. The surface of the substrate is irradiated in a vacuum with an incoherent UV radiation which has a wavelength of 60 nm to 400 nm, preferably a wavelength of 172 nm. In order to form the structures, a mask is placed on the surface of the substrate.
Claims3
In a process for removing and/or structuring surfaces by irradiating with a light source, the improvement which comprises producing incoherent UV radiation having a wavelength of substantially 172 nm with a high-power lamp filled with xenon gas filling, irradiating a polyamide surface for 1 to 30 minutes in a vacuum with the incoherent UV radiation, and removing and/or structuring the polyamide surface to substantially 1.5 .mu.m.
In a process for removing and/or structuring surfaces by irradiating with a light source, the improvement which comprises producing incoherent UV radiation having a wavelength of substantially 172 nm with a high-power lamp filled with a xenon gas filling, irradiating a polyimide surface for 1 to 30 minutes in a vacuum with the incoherent UV radiation, and removing and/or structuring the polyimide surface to substantially 1.5 .mu.m.
In a process for removing and/or structuring surfaces by irradiating with a light source, the improvement which comprises producing incoherent UV radiation having a wavelength of substantially 172 nm with a high-power lamp filled with a xenon gas filling, irradiating a polycarbonate surface for 1 to 30 minutes in a vacuum with the incoherent UV radiation, and removing and/or structuring the polycarbonate surface to substantially 1.5 .mu.m.
Dependencies are inferred from the claim text.