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US 5,207,885 AGranted
Target for reactive sputtering
AssigneeLeybold Aktiengesellschaft
InventorReiner Seiler
Life of this patent
Estimating the term…
Abstract
Target for reactive sputtering in a vacuum coating apparatus consists of at least one of tin and lead doped with 20 to 200 ppm gallium and 2 to 20 ppm phosphorus.
Claims4
Target for reactive sputtering in a vacuum coating apparatus, said target consisting of at least one of tin and lead doped with 20 to 200 ppm gallium and 2 to 20 ppm phosphorus.
Dependencies are inferred from the claim text.