Method of manufacturing microchannel electron multipliers
AssigneeGalileo Electro-Optics Corp.
InventorsJerry R. Horton, G. William Tasker
Life of this patent
Estimating the term…
Abstract
A microchannel plate and method is disclosed. In a preferred embodiment the microchannel plate is a water of anisotropically etchable material having been subjected to a directionally applied flux of reactive particles against at least one face of the wafer in selected areas corresponding to microchannel locations. The flux removes material from the selected areas to produce microchannels in the wafer in accordance with the directionality of the applied flux.
Claims26
A method for manufacturing a microchannel plate comprising the steps of:
- forming a body of etchable material;
- directionally applying a flux of reactive particles against the body in selected areas corresponding to microchannel locations for removing material from the selected areas to produce microchannels in the body aligned in accordance with the directionality of the applied flux;
- and
- activating the microchannels by forming a continuous thin film dynode of less than 1,000 nm to exhibit secondary electron emissivity.
A method for manufacturing an electron multiplier comprising forming a body of etchable material, directionally applying a flux of reactive particles against the body in selected areas for removing material therefrom in order to form at least one electron multiplication channel in the body suitable for receiving a thin film dynode of less than 1,000 nm.
Dependencies are inferred from the claim text.