Device including a tapered microminiature silicon structure
AssigneeBell Communications Research, Inc.
InventorsNicholas C. Andreadakis, Robert B. Marcus, Tirunelveli S. Ravi
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Abstract
Tapered silicon structures, of interest for use, e.g., in atomic force microscopes, in field-emission devices, and in solid-state devices are made using silicon processing technology. Resulting tapered structures have, at their tip, a radius of curvature of 10 nanometers or less.
Claims12
A discharge device comprising at least one tapered silicon protuberance which terminates in an apex whose radius of curvature in a vertical cross-sectional view is less than 10 nanometers, said protuberance having been fabricated by being exposed to an essentially dry oxidizing environment at a temperature not exceeding 1050.degree. C., and by stripping any oxide surface formed from said protuberance.
Dependencies are inferred from the claim text.