Method of making a high band-gap opto-electronic device
AssigneeHewlett-Packard Company
InventorsChih-Ping Kuo, Robert M. Fletcher, Timothy D. Osentowski
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AssigneeHewlett-Packard Company
InventorsChih-Ping Kuo, Robert M. Fletcher, Timothy D. Osentowski
Estimating the term…
A high band-gap opto-electronic device is formed by epitaxially growing the device section in a lattice-matched (Al.sub.x Ga.sub.1-x).sub.y In.sub.1-y P-GaAs system. The band-gap of the epitaxial layer increases with x. Instead of growing the device section directly on the GaAs substrate, a layer of (Al.sub.x Ga.sub.1-x).sub.y In.sub.1-y P, graded in x and in temperature while maintaining substantially y=0.5, is grown as a transitional layer. The high band-gap device structures include homojunctions, heterojunctions and particularly a separate confinement quantum well heterostructures. Various embodiments of the invention include devices on absorbing substrates and on transparent substrates, and devices incorporating strained-layer superlattices.
A method of providing an electro-optical device, comprising the steps of:
Dependencies are inferred from the claim text.