Method for plasma deposition on apertured substrates
AssigneeCelestech, Inc.
InventorsGordon L. Cann, Cecil B. Shephard, Jr., Frank X. McKevitt
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Abstract
The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.
Claims34
A method for depositing a substance comprising the steps of:
- producing a plasma beam containing the constituents of said substance;
- providing a substrate having a surface in the path of said beam, said substrate having at least one aperture through said surface, such that said beam deposits said substance on said surface and a portion of the beam passes through said at least one aperture.
A method for depositing a substance, comprising the steps of:
- producing a plasma beam containing the constituents of said substance;
- providing a substrate having a surface in the path of said beam;
- and
- providing at least one groove having a minimum depth of 2 mm in said surface extending generally across said surface, such that said beam deposits said substance on said surface and a portion of said beam is directed by said at least one groove to the periphery of said surface.
A method for depositing a substance, comprising the steps of:
- producing a plasma beam containing the constituents of said substance, said beam having an axis and an envelope;
- and
- providing a plurality of substrates having surfaces generally along the envelope of the beam and generally parallel to the axis of said beam, such that constituents in the peripheral region of said beam are applied to said surfaces and said substance is deposited on said surfaces.
In a method for depositing a substance, comprising the steps of producing a plasma beam containing the constituents of said substance, and providing a substrate having a surface in the path of said beam;
- the improvement comprising:
- a substrate having at least one aperture through said surface, such that said beam deposits said substance on said surface and a portion of said beam passes through said at least one aperture.
In a method for depositing a substance, comprising the steps of producing a plasma beam containing the constituents of said substance, and providing a substrate having a surface in the path of said beam;
- the improvement comprising:
- a substrate having at least one groove having a minimum depth of 2 mm in said surface extending generally across said surface, such that said beam deposits said substance on said surface and a portion of said beam is directed by said at least one groove to the periphery of said surface.
A method for depositing a substance, comprising the steps of:
- producing a plasma beam having an axis and containing the constituents of said substance;
- providing a plurality of substrates which cause said beam to propagate radially with respect to said axis, said substrates having surfaces generally along the envelope of said radially propagating beam, such that the constituents in the peripheral region of said radially propagating beam are applied to said surfaces and said substance is deposited on said surfaces.
Dependencies are inferred from the claim text.