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US 5,202,095 AGranted
Microwave plasma processor
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsRyuzoh Houchin, Naoki Suzuki
Life of this patent
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Abstract
A microwave plasma processor comprising a vacuum chamber with a gas introduction inlet, an exhaust port, a sample table for loading thereon a sample, a plurality of microwave radiation antennas, and a corresponding plurality of microwave energy introduction inlets thereby enabling a large area substrate to be uniformly plasma-processed at high speed.
Claims7
A microwave plasma processor comprising:
- a chamber, including a first chamber for a sample, and a plurality of second chambers for generating plasma;
- a plurality of microwave radiation antennas outside said second chambers;
- and
- a plurality of microwave introduction inlets from which microwave energy is introduced into said chamber through said microwave radiation antennas,
- said first chamber including a gas introduction inlet, an exhaust port, and a sample table for loading thereon a sample, and said second chambers composed of a dielectric material;
- and wherein said plurality of microwave energy introduction inlets corresponds in number to said microwave radiation antennas.
3 more elements
A microwave plasma processor, comprising:
- a chamber in which plasma is formed, said chamber comprising a main chamber and a plurality of subchambers which protrude from the main chamber;
- and
- antenna means for introducing electromagnetic energy into said chamber, said antenna means comprising a number of antennas corresponding to the plurality of subchambers, each antenna being located outside of said chamber and adjacent to one of said subchambers.
A microwave plasma processor, comprising:
- a chamber in which plasma is formed, said chamber comprising a main portion and a plurality of subchambers which protrude from the main chamber, each of the subchambers being equally spaced about the main chamber;
- and
- antenna means for introducing electromagnetic energy into said chamber, said antenna means comprising a number of antenna corresponding to the plurality of subchambers, each antenna being located outside of said chamber and adjacent to one of said subchambers.
Dependencies are inferred from the claim text.