Source distance adjustment arrangement for uniform illumination of projection surface
AssigneeAgfa-Gevaert
InventorsHubert Hackenberg, Traugott Liermann, Hans-Joachim Schrecke
Life of this patent
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Abstract
A uniform illumination of the projection surface is obtained by measuring light intensity of a projection surface and adjusting a distance between a light source and an optical element in response to the measured light intensity to optimize brightness and/or distribution.
Claims10
A method of uniform illumination of a projection surface with a light source and an optical element located between the light source and the projection surface, comprising the steps of measuring a light intensity on a projection surface;
- and adjusting a distance between a light source and the optical element in dependence on the measured light intensity on the projection surface so as to optimize at least one of brightness and distribution.
An arrangement for uniform illumination of a projection surface, comprising a light source;
- an optical element located between said light source and a projection surface;
- means for measuring light intensity on the projection surface;
- and means for adjusting a distance between said light source and said optical element in dependence on the measured light intensity so as to optimize at least one of brightness and distribution.
Dependencies are inferred from the claim text.