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AssigneeKabushiki Kaisha Toshiba
InventorsTakashi Ishigami, Minoru Obata, Mituo Kawai, Michio Satou, Takashi Yamanobe, Toshihiro Maki, Noriaki Yagi, Shigeru Ando
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This is a highly purified metal comprising one metal selected from the group consisted of titanium, zirconium and hafnium. The highly purified metal has an Al content of not more than 10 ppm. It also has an oxygen content of not more than 250 ppm, each of Fe, Ni and Cr contents not more than 10 ppm and each of Na and K contents not more than 0.1 ppm. The highly purified metal is obtained by either purifying crude metal by the iodide process or surface treating crude metal to remove a contaminated layer existing on the surface thereof and then melting the surface treated material with electron beam in a high vacuum.
A highly purified metal consisting essentially of titanium, having an Al content of not more than 10 ppm.
A highly purified metal consisting essentially of titanium, having an Al content of not more than 5 ppm.
A highly purified metal consisting essentially of titanium, having an Al content of not more than 3 ppm.
A highly purified metal consisting essentially of titanium, having an Al content of not more than 1 ppm.
A highly purified metal consisting essentially of hafnium, having an Al content of not more than 10 ppm.
A highly purified metal consisting essentially of hafnium, having an Al content of not more than 5 ppm.
A highly purified metal consisting essentially of hafnium, having an Al content of not more than 3 ppm.
A highly purified metal consisting essentially of hafnium, having an Al content of not more than 1 ppm.
A highly purified metal consisting essentially of zirconium, having an Al content of not more than 1 ppm.
Dependencies are inferred from the claim text.